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The book explores the intricate behavior of heavy charged particles as they penetrate matter, revealing atomic-scale traces that have significant implications across various advanced fields, including microelectronics, biology, and surface technology. It highlights the limitations of traditional lithography methods and emphasizes the potential of improved irradiation technology using ions, which offer precise energy deposition and the ability to create fine etch pits through track etching. This process allows for the manipulation of materials at a microscopic scale, crucial for technological advancements.
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Ion Tracks and Microtechnology, Reimar Spohr
- Lingua
- Pubblicato
- 2012
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