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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Acquisto del libro
Atomic Layer Deposition, Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman
- Lingua
- Pubblicato
- 2013
- product-detail.submit-box.info.binding
- (Copertina rigida),
- Condizioni del libro
- Danneggiato
- Prezzo
- 166,31 €
Metodi di pagamento
Ancora nessuna valutazione.
- Titolo
- Atomic Layer Deposition
- Sottotitolo
- Principles, Characteristics, and Nanotechnology Applications - 2nd Edition
- Lingua
- Inglese
- Editore
- Wiley-Scrivener
- Pubblicato
- 2013
- Formato
- Copertina rigida
- Pagine
- 272
- ISBN10
- 1118062779
- ISBN13
- 9781118062777
- Serie
- Descrizione
- Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.