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Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, essential in silicon integrated circuit technology. It explores critical processes like controlled doping, ion-solid interactions, and shallow-junction formation. The text also addresses practical applications such as improving corrosion resistance and surface hardening. Key topics include ion ranges, lattice disorder, ion-beam mixing, and stresses, providing a comprehensive understanding of how ion implantation enhances materials properties.
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Ion Implantation and Synthesis of Materials, James W. Mayer, Michael Nastasi
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- 2006
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